@article{GGR:GGR101,
author = "Alexander B.E. Rocholl and Klaus Simon and Klaus Peter Jochum and Frank Bruhn and Roland Gehann and Utz Kramar and Werner Luecke and Michael Molzahn and Ernst Pernicka and Michael Seufert and Bernhard Spettel and Jens Stummeier",
abstract = "National Institute of Science and Technology (NIST) silicate glass SRM 610 is widely used as a certified reference material for various micro-analytical techniques such as SIMS or laser ablation ICP-MS. SRM 610 has been nominally doped with sixty one trace elements at the 500 μg g−1 level, but certified concentration data exist for only a few of these elements. This study reports concentration data for fifty nine trace elements obtained by ICP-MS, SSMS, LIMS, TIMS, INAA, AAS, and PIXE analyses of two different SRM 610 wafers. Most elements fall within a 10% band around a median value of about 440 μg g−1. The REE concentrations are shown to be constant to 3% (1 σ), thus emphasizing the value of SRM 610 as a reference material for REE analyses.Comparison of our values with published data suggests that different SRM 610 wafers are, within errors, chemically identical for most elements. Exceptions to this general rule appear to be restricted to elements which were partly lost during the production of the glass, e.g. Ag and Br. On the basis of six independent determinations of Rb concentrations, which are systematically lower by a few percent than the reported NIST value, we argue that the certified Rb concentration may not be representative for all distributed SRM 610 wafers.",
doi = "10.1111/j.1751-908X.1997.tb00537.x",
issn = "1751-908X",
journal = "Geostandards Newsletter",
number = "1",
pages = "101--114",
publisher = "Blackwell Publishing Ltd",
title = "{C}hemical {C}haracterisation of {NIST} {S}ilicate {G}lass {C}ertified {R}eference {M}aterial {SRM} 610 by {ICP}-{MS}, {TIMS}, {LIMS}, {SSMS}, {INAA}, {AAS} and {PIXE}",
url = "http://dx.doi.org/10.1111/j.1751-908X.1997.tb00537.x",
volume = "21",
year = "1997",
}